Thermal Processing

o2 partial pressure furnace

O2 partial pressure furnace.

O2 partial pressure furnace
Dearborn 300
Dr. Brady Gibbons

Rapid Thermal Processor RX4

This furnace employs IR heating through a quartz chamber for implant annealing, oxidation/nitriding, silicide formation, and other rapid thermal processes.  It is capable of temperatures up to 1200C for a maximum of three minutes.  Regulation extends from room temperature.  Lifetime of the thermocouple degrades rapidly above 1000C.  Processes are carried out at atmospheric pressure in an ambient of Nitrogen, Argon, or Hydrogen:Argon forming gas.

AET Thermal
Rapid Thermal Processor RX4
Thermal processor
Owen Cleanroom
Dr. John Wager

The Owen cleanroom has several Thermolyne furnaces.  These units are used to anneal samples in air ambient up to 1100 C.

Thermolyne
47900, 62700
Furnace
Owen Cleanroom
Dr. John Wager

Thermal processing equipment named Protherm

This lab houses four furnaces capable of 1150 C processing, and one furnace capable of 1700 C.

Protherm
Furnace
Ceramics Synthesis and Measurement Lab
Dr. Caan