Lithography

Lithography equipment named DWL66fs

The DWL66fs is primarily used to generate chrome on quartz lithography masks with a minimum structure size of 1 micron.  Additionally the system can be used for direct write lithography

Heildelberg Instruments
DWL66fs
Direct Write Pattern Generator
Owen Cleanroom
Dr. Pallavi Dhagat

Lithography equipment named MJB3

MaSC currently has two MJB3 contact aligners.  These tools are used for photolithography with critical dimension to approximately 5 um.

Karl Suss
MJB3
Contact aligner
Owen Cleanroom
Dr. John Wager

Lithography equipment named SF-100

The SF-100 maskless lithography system allows for...

Intelligent Micro Patterning LLC
SF-100
Maskless Lithography System