Etch

Image
 The Batchtop system VII

The Batchtop system VII is a reactive ion plasma etcher used primarily for etching silicon dioxide. Other common processes include, oxygen ash and silicon nitride etch.

Plasma-Therm, Inc.
Batchtop System VII
Reactive Ion Etch
Owen Cleanroom
Dr. John Wager

Image
Fume hood and personal protection equipment.

Fume hood and personal protection equipment used for performing wet etch.

Wet Chemical Hood
Owen Cleanroom
Dr. John Wager