John Conley Jr

John F. Conley, Jr. received the B.S. in Electrical Engineering and Ph.D. in Engineering Science and Mechanics from The Pennsylvania State University where he won a Xerox Prize for his Ph.D. dissertation.

He has been a senior member of the technical staff at Dynamics Research Corporation and the NASA Jet Propulsion Laboratory (JPL), the Leader of the Novel Materials and Devices Group at Sharp Laboratories of America (SLA), an adjunct professor at WSU-Vancouver, a technical consultant for Red-Wave Energy, and a testifying expert witness on atomic layer deposition for Morgan Lewis & Bockius. Since 2007, he is a Professor of Electrical Engineering and Computer Science (EECS) and of Materials Science at Oregon State University where he serves as Director of the Materials Synthesis and Characterization (MaSC) and Semiconductor Cleanroom facilities.

Dr. Conley has served on the technical and organizing committees of numerous IEEE and AVS conferences including as Technical Program Chair of the AVS International Conference on Atomic Layer Deposition (ALD) and the 2023 AVS Workshop on Innovative Nanosystems and Devices, as well as several IEEE reliability meetings. He is currently an Associate Editor of IEEE Transactions on Electron Devices and has been a guest editor for IEEE Transactions on Device and Material Reliability.

Prof. Conley's research group advances atomic layer deposition (ALD), including energy enhanced (EE) ALD, for nano-electronic device applications (such as MIM, MIIM, MOS, thin film transistors (TFTs), etc.) and uses internal photoemission (IPE) spectroscopy to measure interfacial barriers to electron transport in operating devices. His work (including more than 160 journal and/or conference papers, 190 additional conference presentations (including more than 25 invited talks), and 20 U.S. patents) has received more than 8,000 citations (Google Scholar).

Dr. Conley is a Fellow of the IEEE, a Signature Faculty Fellow of the Oregon Nanoscience and Microtechnologies Institute (ONAMI), and a Fellow of the American Vacuum Society (AVS).