Atomic Layer Deposition (ALD) has remarkably developed in semiconductor and nano-structure applications since early 1990. The unique properties, including controlling atomic-level-thickness, manipulating atomic-level-composition control, and depositing impurity-free films uniformly, may accelerate ALD related industries and applications in functional thin film markets. One of big commercial industries, display market, just starts to look at the potential to adopt various functional inorganic/organic/hybrid films based on ALD/molecular layer deposition (MLD) techniques in emerging applications, such as transparent, flexible, and wearable electronics. Recently, amorphous oxide semiconductors have been widely studied for the potential use in flat panel displays such as active matrix liquid crystal display (LCD) and Organic light emitting diodes (OLEDs). Since reporting amorphous InGaZnO semiconductor thin film transistor (TFT) in 2003 & 2004, many multi-component oxide semiconductors have been intensively investigated and developed by reactive sputtering method. Very recently, the sputtered InGaZnO TFTs are already adopted in mass-production to fabricate AMOLED TVs. However, there remain several problems such as high mobility & stability issues. Also, virtual and argument reality (VR, AR) applications are rapidly emerging in display markets but the main issues are high resolution and low voltage driving technologies. In this talk, I will take the brief emerging display market trend and forecast to understand what they are looking for. In fact, the AMOLED (active matrix organic light emitting diode) Television markets are just starting at early 2013. There are a few possibilities and needs to be developing for AMOLED, flexible and transparent Display markets. Then, firstly, functional oxide and organic thin films, deposited by ALD/MLD have been demonstrated in emerging applications (flexible, transparent, and wearable things). Gas diffusion barrier property such as water and oxygen water vapor are important for passivation and encapsulation applications. Secondly, the functional oxide conductor/semiconductor films deposited by ALD will be discussed for applying transparent conductor and thin film transistor as an active layer even on flexible substrates, including InOx, SnOx, ZnSnO, InZnOx, InZnSnOx, and InGaZnOx. Also, I will update recent results of p-type ALD SnO semiconductors including physical, chemical, and electrical properties, that is a unique ALD film under a specific chemical precursor. As a new deposition process in Display industries, ALD will be intensively discussed for applying the emerging electronic devices.
Jin-Seong Park is currently a Professor in Division of Materials Science and Engineering at Hanyang University, Seoul, Republic of Korea since 2013. He received his B.S. (1997), M.S. (1999) and Ph. D. (2002) in Materials Science and Engineering from Korea Advanced Institute of Science and Technology (KAIST, advisor, SangWon Kang; PEALD Inventor & Genitech (merged to ASM) Founder). He worked as a post-doctor in Chemistry and Chemical Biology, Harvard University (advisor Roy G. Gordon) from 2003 to 2005. Then from 2005 to 2009, he had been working at the Samsung Display (Former, Samsung SDI) as senior researcher to develop oxide semiconductor thin film transistor (TFT) and flexible thin film encapsulation (TFE) for transparent/flexible AMOLED Applications. engineering. From 2009 to 2013, he worked as an Associated Professor in Dankook University. His current research interests focus on the functional thin film material, process, and electronics application, mainly Atomic Layer Deposition/Molecular layer Deposition and Display device related Topics: n-type IGZO & p-type oxide TFT, OLED TFE, Gate Insulator/Passivation (SiO2, SiNx, and high k) and p-type SnO, thin film encapsulation. Also, Areal Selective Atomic Layer Deposition is one of important topics in my group. His group has been strong relationship with not only panel/chip makers (LG Display, Samsung Display, SK hynix etc.) but also precursor companies, to develop novel/functional thin film materials & processes. He had several awards, Merck Young Scientist Award (2014, Developing successful AMOLED technology based on Oxide TFTs), President Award from Korea Evaluation of Industry and Technology (2017, Flexible Thin Film Transistor and Encapsulation for OLED). He was a general chair of International ALD conference 2018 in 2018 (Incheon, Korea) and has been a committee member in ALD and AVS.