Unveiling the ALD revolution: Oregon State’s pioneering semiconductor advancements
In the evolving landscape of semiconductor research, atomic layer deposition has emerged as a touchstone for innovation. A thin film deposition technique, in which chemical precursors interact with surfaces in a controlled fashion, ALD enables precise, layer-by-layer assembly of materials at the atomic scale. ALD is experiencing groundbreaking advancements at Oregon State University, where researchers are not only refining traditional ALD techniques but also working to expand applications.