Gregory S. Herman received his B.S. degree in Chemistry at the University of Wisconsin-Parkside in 1985 and his PhD. in Physical Chemistry at the University of Hawaii at Manoa in 1992. In 1992 Gregory received a National Research Council Postdoctoral Fellowship at the Naval Research Laboratory and performed research at the National Synchrotron Light Source at Brookhaven National Laboratory. Later in 1992 he began a second postdoctoral fellowship at Pacific Northwest National Laboratory (PNNL).

From 1995 until 2000 Gregory was a senior research scientist in the Environmental Molecular Sciences Laboratory at PNNL. From 2001 until 2007 he was an R&D engineer in the Advanced Materials and Processes Laboratory at Hewlett-Packard Corporation. From 2007 until 2009 he was a senior scientist in the Materials and Device Applications Laboratory at Sharp Laboratories of America.

In 2009 he joined the School of Chemical, Biological and Environmental Engineering at Oregon State University (OSU) as an Associate Professor. Gregory has a broad background covering surface science, heterogeneous catalysis, thin film growth, device physics, and nanotechnology. His research covers printed and flexible oxide-based thin film transistors, memristors, microfluidic nanomaterials synthesis, photochemistry, and photovoltaics. The primary focus of this research is on new materials development and obtaining fundamental understanding the structural/compositional/functional relationships of electronic, optoelectronic and catalytic materials. He was instrumental in the development oxide-based semiconductors for thin film transistor applications and holds several key patents covering various materials compositions. He has published over 70 peer-reviewed scientific publications, has over 50 patents, and given numerous invited seminars and lectures. Currently Gregory is also Associate Director of the Oregon Process Innovation Center for Sustainable Solar Cell Manufacturing.

Gregory Herman’s research expertise covers the detailed characterization of materials using surface science techniques. We perform ambient-pressure X-ray photoelectron spectroscopy and ambient-pressure scanning tunneling microscopy to obtain a fundamental mechanistic understanding of reactions at surfaces. Applications include: the design of new catalysts to better control reaction selectivities and activities; characterizing radiation induced mechanisms for advanced semiconductor manufacturing; and design of novel sensors and understanding their surface chemistries.